{"id":3270249,"url":"https://alion.io/job/michael-page-dry-etch-process-development","title":"Dry Etch Process Development","company":{"id":2969709,"name":"Michael Page","domain":"michaelpage.co.in","url":"https://alion.io/company/michaelpage-co-in","size_band":null,"is_staffing_agency":true,"employer_type":"agency","is_intermediary":false,"listed_via":null,"ats_vendor":null,"truth_index":null},"role":"Industrial Engineering","role_family":"Industrial Engineering","seniority":"staff","employment_type":"full_time","work_mode":"on_site","remote_scope":null,"remote_scope_basis":null,"remote_working_hours":null,"hiring_geo_confidence":"structured","locations":["Singapore"],"countries":["SG"],"hiring_countries":[],"hiring_countries_total":0,"salary":{"min":15000,"max":18333,"currency":"SGD","period":"month","gross":true,"usd_annual":172152},"salary_estimate":null,"experience_years_min":10,"visa_sponsorship":false,"relocation_package":false,"has_equity":false,"technologies":[{"name":"Photolithography","optional":false},{"name":"Plasma Etch","optional":false},{"name":"Python","optional":false},{"name":"Statistical Process Control","optional":false}],"status":"live","first_seen_at":"2026-10-26T00:00:00Z","employer_posted_date":null,"last_verified_at":"2026-10-26T00:00:00Z","board_verified":false,"closed_at":null,"days_open":8,"trust":{"level":"not_scored","repost_count":null,"flags":[],"days_open":8},"description":"Lead next-generation NAND dry etch technology development\nDrive innovation in advanced semiconductor process R&D\nAbout Our Client\nOur client is a globally recognised semiconductor technology leader at the forefront of memory and storage innovation. With a worldwide footprint spanning multiple countries, extensive R&D investments, and advanced manufacturing facilities, the organisation plays a significant role in enabling next-generation technologies across data centres, artificial intelligence, mobile devices, automotive applications, and cloud computing infrastructure.\nJob Description\nLead the development and optimisation of advanced dry etch processes supporting next-generation memory technologies.\nDrive process innovation to meet challenging device architecture, structural and electrical performance targets.\nDefine and execute technology development strategies for critical semiconductor process modules.\nPartner closely with process integration, lithography, deposition, wet process, CMP and metallisation teams to solve complex manufacturing challenges.\nCollaborate with equipment engineering teams and suppliers to establish future hardware and capability roadmaps.\nLead technical investigations, root cause analyses and problem-solving initiatives involving high aspect ratio and advanced pattern transfer applications.\nPresent technical findings, project updates and development strategies to senior stakeholders while mentoring junior engineers and contributing to technical leadership initiatives.\nThe Successful Applicant\nBachelor's, Master's or PhD in Chemical Engineering, Mechanical Engineering, Electrical Engineering, Materials Science, Physics, Chemistry, Semiconductor Engineering or a related discipline.\nStrong experience supporting R&D and technology development programmes transitioning into manufacturing environments.\nDeep understanding of plasma etching fundamentals, plasma chemistry, surface interactions and transport phenomena.\nProven track record leading complex technical projects and cross-functional engineering teams.\nExperience developing solutions for high aspect ratio etch applications and advanced pattern transfer challenges.\nStrong knowledge of semiconductor dry etch equipment, process characterisation methodologies and statistical process control.\nExperience managing supplier collaboration, technical evaluations and equipment development initiatives.\nProficiency in data analysis tools and statistical software, with exposure to data science, Python, automation or AI-driven process optimisation considered advantageous.\nWhat's on Offer\nOpportunity to contribute directly to the development of future-generation semiconductor memory technologies.\nExposure to cutting-edge R&D programmes addressing some of the industry's most complex process integration challenges.\nComprehensive learning and development programmes, including technical leadership training.\nInternational exposure through collaboration with global R&D, manufacturing and equipment partners.\nContact\nEugenia NG (Lic No: R1108105 / EA no:18S9099)\nQuote job ref\nJN-092026-7114173\nPhone number\n+65 6541 9961\n\nMichael Page International Pte Ltd | Registration No. 199804751N \nSkills\nPlasma Etch, Collaborate With Engineers, Process & Technology Development, Electrical Design, metal manufacturing, Process Integration, Lithography, Wet Chemical Etching, Mentoring for Developers, Etching, Root Cause Problem Solving, chemical etching, Technical Leadership, Depositions, Present Findings, Wet Chemistry","description_format":"text","description_chars":3521,"description_truncated":false,"requirements":{"experience_years_min":10,"management_years_min":null,"team_size_min":null,"manages_managers":false,"education":null,"security_clearance":false,"languages":[]},"benefits":[],"hiring_locations":[],"hiring_excludes":[],"relocation_offered":false,"industries":[],"lifecycle":[{"event":"open","at":"2026-10-26T10:28:51Z"}],"visa":[],"liveness":{"score":54,"band":"ok","label":"Likely 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